A Unified Framework for Simultaneous Layout Decomposition and Mask Optimization

Abstract

In advanced technology nodes, layout decomposition (LD) and mask optimization (MO) are two key stages in integrated circuit design. Due to the inconsistency of the objectives of these two stages, the performance of conventional layout and MO may be suboptimal. To tackle this problem, in this article, we propose a unified framework, which seamlessly integrates LD and MO. We propose a gradient-based approach to solve the unified mathematical formulation, as well as a set of discrete optimization techniques to avoid being stuck in local optimum. The conventional optimization process can be accelerated as some inferior decomposition results can be smartly pruned in early stages. The experimental results show that the proposed unified framework can achieve more than $34\times $ speed-up compared with the conventional two-stage flow, meanwhile, it can dramatically reduce EPE violations by more than $8\times $ , and thus maintain better design quality.