Abstract

Pulsed-current-induced electromigration failure was studied under various repetition frequencies and current densities. Self-joule-heating of the conductors during stressing was monitored directly by detecting the infrared intensity emitted from the conductor. It was found that there is a critical pulse width for electromigration under pulsed stress conditions which depend on the peak current density and substrate temperature. This fact suggests that a continuous force is needed to cause Al ions to migrate. When a pulse width is sufficiently short, Al ions cannot move and settle in new unstable sites. >

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