A thin-film resistive sensor for measuring atomic hydrogen flux density

Abstract

An eight-channel thin-film resistive atomic hydrogen (AH) sensor is described. It is intended to measure the AH flux density in an atomic-molecular mixture at a reduced gas pressure (10−2–10−4 Pa), particularly under the action of infrared and visible radiation noise, in a computer-aided mode. The sensor can be used for measuring a distribution of the AH flux density of the large cross-section beam. The range of AH flux density measurements is 5 × 1013 − 1016 atoms/(cm2 s), the measurement time is 1–10 min, and the measurement error is 10%. The sensitive element of the sensor is made using planar technology, which offers a chance to attain a high resolution in spatial distribution mesurements.