Abstract
CO adsorption on vacuum deposited Cu/Mn thin films has been investigated at room temperature by UV-synchrotron radiation photoemission spectroscopy. Mn films covered by different copper coverages have been considered. The reactivity of the system Cu/Mn towards CO adsorption decreases as the Cu coverage increases, and already at low coverages CO adsorption is molecular. The effect of copper diffusion into the substrate on CO adsorption has been observed.
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