Abstract
The major problem in laying down thin metallic films by vacuum deposition is to produce the metal vapour. Nine basic methods of producing a metal vapour are discussed. Six of these involve heating the metal, and include electron bombardment heating and induction heating. The other three methods are forms of sputtering. Some of the strengths and weaknesses of the various methods are outlined. The conclusion is that for general purpose, reliable, metal evaporation, electron bombardment heating is the best method, but for certain special requirements DC sputtering is preferred.
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