Abstract
Titanium nitride (TiN x ) was deposited on a plastic Acrylonitrile–butadiene–styrene substrate by inductively coupled plasma (ICP) sputtering. Many PVD coating processes, currently used in industry, are quite inefficient as there is a need for an extensive cooling time. However, the ICP technique is a high-density plasma technique, which allows deposition on substrates like plastics at low temperatures. Through the plasma diagnosis, the plasma density of the ICP sputtering system was superior to that of the other commercial PVD processes.
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