Abstract
The present work incorporates a study on nucleation, and growth due to the changes in the nano-structural properties as a function of thickness and grain boundary reflection in tin thin nanofilms Thickness happens to be one of the important and crucial nanofilm preparative parameters which dictates majority of properties like, nano-structure, electrical, optical and morphological texture of evaporated tin nanofilms. Hence, we have selected tin nanofilms in the thickness range 20-160 nm, in order to study the thickness dependence of their nano structural and electrical properties, in the temperature range 77-450 K, in detail. All the films were grown in a conventional vacuum coating unit under a pressure of ∼10-6 Torr at room temperature of 22 0C, onto cleaned glass substrates. The tin film nano-structure was analyzed by Transmission Electron Microscope(TEM). The nano structural properties can be tuned to the desired level and application by the proper choice or proper combination of deposition parameters. And it is found to depend upon the nature of the substrate material, environment and the binding force between the substrate material and evaporated tin atoms.
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