A study of surface morphology of Fe/p-Si hybrid structure using atom force microscope

Abstract

p-Si substrate was cleaned by chemical means. After the cleaning, iron thin film was deposited on the silicon substrate by electron beam evaporation method with high purity Fe target. Then, the roughness parameters of the sample after chemical cleaning and after obtaining a thin layer were compared. Surface roughness measurement of the iron thin film in the nanometer scale can be accurately determined using the AFM. Apart from the average roughness, all the roughness parameters of the surface increased. The average roughness, average height, root mean square roughness, and other parameters are used to analyze surface morphology.