Abstract
This paper presents a review on using MEMS based mirror arrays to achieve maskless lithography in order to eliminate mask costs in the micro fabrication processes. With the advanced technology nodes, it becomes more and more costly to produce the lithography masks. Especially with the extreme ultraviolet lithography technique, the necessity to use maskless lithography becomes more obvious. Several universities and companies fabricated tilting mirror style or piston style mirror arrays to propose a solution to maskless lithography processes.
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