Abstract
After the discovery of carbon nanotubes (CNTs) by Sumio Iijima in 1991, several methods have been developed to synthesize them. High-temperature techniques, such as laser ablation and arc discharge, are now replaced by a low-temperature technique like chemical vapor deposition (CVD). Floating catalyst chemical vapor deposition (FCCVD) method is extensively researched due to its ease of fabrication, mass production at low cost and high purity output. The motive of this paper is to discuss the influence of three major factors on the growth of CNTs using the FCCVD method, which can help us better understand the process of FCCVD as well as the potential challenges faced by this method.
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