Abstract
In this paper, we propose a laterally double-diffused metal-oxide-semiconductor field-effect transistor (LDMOSFET) that uses a dummy gate on top of the lightly-doped drain (LDD) region in a reduced surface field (RESURF) structure. The structure is based on the partial silicon-on-insulator (PSOI) structure to increase the operating frequency of the device. The use of the dummy gate induces another electric field peak in the structure, which increases the breakdown voltage of the transistor. It also improves the gate-drain feedback capacitance, the transconductance, and the ON-resistance of the device. For a LDD length of 3 µm, the breakdown voltage increases about 10%, the transconductance increases over 200%, and the ON-resistance decreases about 45%. When a LDD length of 10 µm is used, the increase in the breakdown voltage is 17%. In addition, we propose a breakdown voltage model for the structure, which may be used to optimize the design of the structure.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
