Abstract
This article demonstrates that ZnO can be used both as the insulating dielectric and the channel by appropriately mixing with lithium and indium, respectively. The ion-conducting lithium zinc oxide (Li2ZnO2) as the dielectric and indium zinc oxide (IZO) as the channel used to fabricate thin-film transistors operating in accumulation mode are derived using the solution-processable method. The novelty of the structure is that both dielectric and channel are made up of ZnO, which provide the possibility of least interface trap states with very high capacitive coupling (318 nF/cm2) makes the device more attractive for low power electronics. The fabricated devices exhibit low operational voltage (≤2V) with high carrier mobility. Indium doped-ZnO is a large-bandgap material that can be utilized for narrowband UV-B (310 nm) detection, for narrowband phototherapy to treat certain skin diseases.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.