Abstract
Silicon-on-insulator (SOI) metal-oxide-semiconductor field-effect transistor (MOSFET) offers a number of advantages over conventional bulk silicon transistors. In this paper, we present a new SOI device structure called a “partial-ground-plane” SOI MOSFET down to 50 nm channel length. This new device shows good suppression of short-channel effect together with a small subthreshold swing and has a good driveability with a low leakage current.
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