Abstract
Diamond films were deposited on alumina substrates by a microwave plasma chemical vapor deposition (MPCVD) method. It is shown that by using appropriate pre-treatments, such as polishing the substrate surface carefully and by in situ pre-deposition of a carbon layer on the alumina substrate surface, one can significantly enhance the nucleation of diamond. The mechanism of the process has been considered using a droplet model with a quasi-equilibrium approximation.
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