Abstract
By DC magnetron sputtering ReN and multilayers of TiAlN/ReN films were produced. The coatings were deposited onto high-speed steel (AISI M2) samples and silicon wafers. Analysis of the microstructure and phase composition showed that the ReN monolayer, which was the same as the coating used subsequently for the manufacture of the multilayers of TiAlN/ReN, possessed a cubic crystalline structure. The ReN coating had preferential columnar growth in the direction of the plane (111) and presented precipitates of the rhenium oxides ReO2 and ReO3. A detailed study of the electrochemical behavior and corrosion resistance of the coated steel substrate as a function of the number of TiAlN/ReN bilayers was carried out using electrochemical impedance spectroscopy and polarization measurements. The coatings exhibited a relative high hardness and Young's Modulus, and a better performance against corrosion in aqueous media rich in chlorine ions when the bilayer number and period were 5 and 221.2 nm, respectively. It was observed that the formation of rhenium oxide particles influences the electrochemical behavior of coatings.
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