A Novel Layout Approach Using Dual Supply Voltage Technique on Body-Tied PD-SOI

Abstract

AbstractThis paper presents a novel layout approach using dual supply voltage technique. In Placing and Routing (P&R) phase, conventional approaches for dual supply voltages need to separate low supply voltage cells from high voltage ones. Consequently, its layout results tend to be complex compared with single supply voltage layout results. Our layout approach uses cells having two supply voltage rails. Making these cells is difficult in bulk due to increase in area by n-well isolation or in delay by negative body bias caused by sharing n-well. On the other hand, making cells with two supply voltage rails is easy in body-tied PD-SOI owing to separation of transistor bodies by trench isolation. Since our approach for dual supply voltages offers freedom for placement as much as conventional ones for single supply voltage, exsting P&R tools can be used without special operation. Simulation results with MCNC circuits and adders have shown that our approach reduces power by 19 % and 25 %, respectively, showing almost the same delay with single supply voltage layout.KeywordsSupply VoltageCritical PathTrench IsolationArea PenaltyFull Adder CellThese keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.