A novel focused-ion-beam lithography process for sub-100 nanometer technology nodes

Abstract

A focused-ion-beam (FIB) machine is a versatile tool used extensively in the integrated circuit (IC) industry for conducting failure analysis, prototype fabrication, and device repair. Lithography can also be performed using FIB for direct patterning of photoresists without using a mask. The FIB technique has several advantages over other maskless processes, such as direct-write e-beam lithography; ion-beam patterning of the photoresist offers higher resist sensitivity and lesser backscattering/proximity effects than the e-beam patterning. In this paper, we investigated a new FIB lithography process, called NERIME (negative resist image by dry etching). The NERIME process is a single-layer resist scheme, which implements a Ga + FIB exposure of DNQ/novolak-based resists, followed by a near-ultraviolet (NUV) flood exposure, silylation, and oxygen dry etching. The NERIME process could not only yield both positive and negative images, but also achieve a nanometer resolution down to 65 nm and a high aspect ratio for the processed patterns. The principle of the negative image formation was also investigated by TEM and found to be due to the creation of a thin gallium oxide mask layer during etching. The NERIME process could be utilized for specific CMOS processing steps for the next generation technology nodes, such as high-resolution lithography over topographical surfaces.