Abstract
An ion optical system for use with EHD ion sources was designed using a cad program and constructed based on the design. This system is composed of six‐cylinder electrodes of 10 mm diam where the two middle electrodes function as octopole deflectors. The design goal was to produce a submicron ion probe capable of scanning a 2×2 mm square field under the condition that ion beam energy, the energy spread and acceptance half‐angle are 30 keV, 20 eV and 2 mrad, respectively. Preliminary experiments using an electron gun showed that the optical characteristics such as focusing voltage, deflection efficiency and deflection distortion were in good agreement with the results of computer simulation. Deflection characteristics using an EHD Ga ion source showed that an undeflected probe size of 1.5 μm in diameter increased only by 0.4 μm for 0.87 mm deflection even if no dynamic correction is made.
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