Abstract
A new procedure for the fabrication of metal nanowires by template-assisted electrodeposition using porous polycarbonate templates is described. A thin sputtered film of silver (≤15nm) was deposited onto one side of the template. The silver seed layer was used to catalyse electroless copper deposition and a copper layer was grown on top (300–500nm) in less than 10min. The copper layer served to seal the pores of the template and to form an electrode of high electrical conductivity. The copper layer was easily removed with a chemical etchant to aid the release of the nanowires from the template mask after growth. To demonstrate the process, copper nanowires were prepared by controlled potential deposition and characterised by SEM and TEM. This new procedure has the ability to be applied to the preparation of a wide range of metallic nanostructures over a wide range of scales. It avoids the need for an extended vacuum deposition step and has the advantage of using low-cost metals in a combined short vacuum/wet chemical process so as to form the critical electrode layer for nanowire growth.
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