Abstract
A specialized furnace that is compatible with the optical-lever method of thin-film stress measurement has been developed. Its design is geared toward experiments in which changes in stress at constant temperature are to be monitored. Important capabilities include a maximum temperature of over 700 °C, good temperature control, hot-furnace sample insertion, lack of interference with stress measurement, and the use of inert gas or steam as ambients. Application of the furnace to the study of thermally activated material processes is demonstrated in experiments involving water sorption in phosphosilicate glass and crystallization of amorphous silicon.
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