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Abstract
An apparatus for measuring the thermal expansion of thin films has been developed. The film, deposited on a substrate, was heated with hot nitrogen gas and the warp of the substrate was measured by an optical lever method. Films of iron, chromium, vanadium, and cobalt ferrite were deposited by sputtering and their thermal expansions were measured between 25 degrees C and 100 degrees C. The values of the thermal expansion coefficients were in good agreement with reported data for the bulk specimens.
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