Abstract
A new 2 MV single-ended ion accelerator has been built for ion implantation purposes. The maximum beam current is ≈ 400 μA. An E × B filter (Wien filter) selects the ion mass M to be accelerated. The mass resolution M/ ΔM of the filter depends on the beam current I and iss ⪅ 15 at I ≈ 400 μ A and ⪆ 50 at I ⪅ 10 μ A . The Wien filter is equipped with an electromagnet thus allowing acceleration of the total source output, if desired, by switching off the filter.
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