Abstract

An Energy-Efficient Computing-in-Memory (CiM) cell design utilizing a Negative Capacitance (NC) FET has been proposed to support computing architectures for Deep Neural Networks (DNNs). The NCFET device characteristics for CiM architectures have been studied to determine an optimal device performance window by changing the thickness of ferroelectric layer (Tfe). The performance metrics such as read margin (RM), write margin (WM), read energy and write energy of NCFET 6 T SRAM cell are analyzed with varying Tfe at two different supply voltages 0.3 V and 0.5 V respectively. NCFET based SRAM cell design achieves higher RM and WM at Tfe of 3 nm and lower energy consumption at 1 nm Tfe as compared with the baseline SRAM cell design at both VDD = 0.3 V and VDD = 0.5 V respectively. 6 T NCFET based CiM cell design for performing basic input-weight product operation (IWP) has been demonstrated and performance comparison is done with baseline CMOS design at VDD = 0.3 V and VDD = 0.5 V. In comparison with the baseline CMOS CiM cell design, NCFET based SRAM CiM design achieves ∼2.59x and 1.62x lower energy consumption at VDD = 0.3 V and VDD = 0.5 V respectively with an optimal Tfe window of 1–3 nm.

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