Abstract
The design, operation, and characterization of a new, adjustable-grid, multiaperture ion source are described. The capability for in situ relative lateral motion of the grids allows beam steering and alignment during source operation. The maximum beam deflection angle is ∼10° at a beam acceleration voltage Vb=1000 V. The grid separation distance dg is also adjustable in situ, allowing independent control over beam current and voltage while maintaining a minimum beam divergence. Decreases in beam divergence angle α, by as much as a factor of 3 over a comparable fixed-grid source, were obtained. Beam accelerating voltages Vb ranging from 200 to 1000 V were investigated for dg values between 1 and 4 mm with a grid hole diameter of 2 mm. Minimum α values ranged from 4° to 7°. The total current density at minimum α for dg=1 mm and Vb=1000 V was 2.2 mA cm−2. The dependence of the measured beam divergence on source operating conditions and grid geometry is explained using a simple ion-optics model.
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More From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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