Abstract
In this work, we present a micromachined fluorine-based ion source (IS) for nano-/micro-processing applications. Our proposed structure is composed of an out-of-plane Si micro-emitter surrounded by four segmented annular micro-channels. The segmented channels were implemented to control the ionic liquid (IL) flow supplied to the tip emitter, enabling to broaden the working regime and overcome the droplet emission which was observed in the conventional ionic liquid ion source (ILIS). The 1-ethyl-3-methylimidazolium tetrafluoroborate (EMIM-BF 4 ) IL was used to produce reactive fluorine-based ions. The ILIS enabled to emit the fluorine-based ions without droplets for a wide range of voltage supply from 2.8 kV to 5 kV. The ion source was demonstrated for patterning a Si structure with the maximum etching rate of 150 μm3.μA-1.min-1.
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