Abstract
A method to measure temporal and spatial evolution of sheath in plasma immersion ion implantation (PIII) process is presented. A long Langmuir probe (Φ5 mmx Φ78 mm) with low bias is used to detect the sheath propagation and backup with time. The substrate made of Al cylinder (Φ20 mmxΦ150 mm) is immersed in nitrogen and argon plasma induced by magnetron self-sustained discharge. The maximum sheath sizes, at different plasma densities under different discharge currents, are measured and compared.
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