Abstract
This paper introduces a method for calculating the thickness of thin films by means of transmittance spectrum, especially the ones deposited on the glass substrates. The film thickness iscalculated by this method and compared with the results measured by probe testmethod, the errorsare less than 3%. Compared with the past ones, this method does not need to peel off the substrate and thin films, does not destroy the surface of thin films, and can detect the smoothness and thickness of thin films at any time. It can be widely used in industrial films deposition to improve the production and efficiency.
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