Abstract
A methacryl ethyl-functionalized soluble polypyrrole was designed and prepared by chemical oxidative polymerization for rapid fabrication of high-aspect-ratio pillar arrays. The chemical structures of the pyrrole derivative and the corresponding polypyrrole were characterized by FTIR and 1H NMR. The polypyrrole with a weight-average molecular weight (Mw) of 7376 exhibits good solubility in several organic solvents, favorable thin film-forming ability and two UV–Vis absorption peaks at 280 and 380nm in tetrahydrofuran solution. The dilute chloroform solution of the polypyrrole is a Newtonian fluid with a low viscosity and shows a significant increase in the electrical conductivity with increasing the polypyrrole content. Moreover, an insulating photoresist can be transformed into a conductive photoresist by doping this polypyrrole. Electrowetting driven structure formation experiments have confirmed that the conductive photoresist can fulfill rapid fabrication of higher-aspect-ratio pillar arrays compared with the insulating photoresist.
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