A high-voltage pulse generator for plasma ion immersion implantation applications

Abstract

The design and construction of high-voltage pulse generator for applications in the treatment of metal and polymer materials by plasma ion immersion implantation (PIII) are described. The generator was built in a circuit category of pulse forming network (PFN), consisting of ten LC sections with L=300 /spl mu/H, C=2.5 nF and an air core high-voltage pulse transformer. The instrument was designed to produce an adjustable, several amperes, flat 70 kV pulse for over 15 /spl mu/s with a pulse repetition frequency (PRF) from 50 to 500 Hz. The generator is fed with a sinewave, constant high current source, and a 10 kV, 2 A switching power supply. The voltage and current pulse shapes of the PIII reactor using this pulse source are presented.