Abstract

Summary form only given, as follows. The design and construction of a compact high voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma ion immersion implantation (PIII) are described. The generator was built on a circuit category of pulse forming network (PFN), consisting of nine LC sections with L=270 /spl mu/H and C=2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 /spl mu/s pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with a sine-wave constant current source, and a 60 kV, 15 mA switching power supply.

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