A governing parameter for electromigration damage in passivated polycrystalline line and its verification

Abstract

The atomic flux divergence due to electromigration in unpassivated metal line, AFDgen, has been formulated considering two-dimensional distributions of current density and temperature and also, simply considering structures of polycrystalline and bamboo lines. The divergence AFDgen has been identified as a governing parameter for electromigration damage in unpassivated polycrystalline and bamboo lines thorough experimental verification. In those studies, we have employed the uncovered metal liens as the first step in the development of a practical and universal prediction method for electromigration damage. On the other hand, it is known that in passivated lines, a mechanical stress (atomic density) gradient is induced by electromigration, and plays an important role in electromigration mechanism. In this study, a governing parameter, AFDgen*, is formulated for electromigration damage in passivated polycrystalline lines. The formulation is carried out by adding the effect of the atomic density gradient to...