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https://doi.org/10.1016/0376-4583(80)90032-1
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Cite Journal: Surface Technology |  Publication Date: Jun 1, 1980 |
 Citations: 3 |
A general model of the chemical vapour deposition process is elaborated using discrete model analysis and a flow graph technique. We present the method of modelling and a simple set of equations that allows an analytical formula for the dependence of the growth rate on process parameters to be obtained.
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