A Gas-Discharge Sputtering Device Based on a Planar Magnetron with an Ion Source

Abstract

A gas-discharge device based on a planar magnetron and a plasma ion source is considered. The longitudinal injection of an ion beam into the magnetron and sputtering of the cathode and central anode of the magnetron by the ion beam contributes to the ignition of an anomalous low-pressure (below 8 × 10–2 Pa) glow discharge in the magnetron. It has been found that the discharge ignition voltage decreases with an increase in the ion energy and depends on the ion-beam current in a threshold manner. The prospects of expanding the functionality of planar magnetrons in the synthesis of nanostructured TiN–Cu composite coatings are shown.