Abstract
The vapour deposition of Pt by flash evaporation (10 2–10 3 A ̊ sec ) onto W, Ir and Mo emission-tip substrates at temperatures of 78°, 300°, 600° and 700°K has been studied by field-ion microscopy. Pt vapour deposited onto (001) NaCl substrates at 600°K was also studied for comparison by transmission electron microscopy. The overgrowth of the emission tips was characterized by continuous pseudomorphic layer growth having a perfect epitaxial relationship { hkl} Pt ‖ { hkl} substrate for a stable overgrowth thickness. The observed stable overgrowth thickness, which is dependent upon the high electric field stresses in the field-ion microscope, increased with an increase in substrate temperature and a decrease in crystallographic misfit between the overgrowth and substrate, which ranged from 2 to 20% for the systems investigated in the field-ion microscope. Nucleation and cluster formation occurred simultaneously at steps, terraces and in { hkl} plane faces as a result of the kinetic and thermal properties of the high vapour flux.
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