Abstract

The in situ growth of a deposit in electron-beam-induced deposition (EBID) was studied bydynamic Monte Carlo simulation, showing first the preferential growth of depositalong the incident direction of the electron beam. The effects of electron energy,probe size, substrate thickness, and deposit (or substrate) composition on EBIDwere investigated and discussed, considering the electron scattering of not onlysecondary electrons but also primary and backscattered electrons in solids. Byincluding the depositions at not only the top but also the bottom surfaces of thesubstrate, the growth model of the deposit in EBID was modified. Concerning theresolution of EBID, a small lateral size can be achieved on the deposit (or substrate)containing light atoms using a high-energy electron beam with a fine probe size.

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