Abstract
In this work, the plasma polymerization of propanethiol is investigated with the aim to control the thiol density [SH] in the coatings. The results reveal a nearly constant evolution of [SH] regarding the mean power dissipated in the discharge. This peculiar behavior is explained considering (i) mass spectrometry data revealing a similar relative concentration of condensable SH‐bearing species in the plasma and (ii) similar energetic conditions at the growing film/plasma interface. Finally, it is observed that the low 〈P〉 synthesized films are not chemically stable in solution likely due to the release of H2S molecules trapped in the material network. The whole set of our data allows to provide a deeper understanding of the growth mechanism of propanethiol plasma polymer, essential for future development.
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