Abstract
Abstract Sputtering from hexagonal BN targets, using a conventional magnetron (MS) or ion beam (IBS), produces films consisting of both sp 2 - and sp 3 -bonded BN and BN x . We present here the dependence of BN film composition, structure, morphology and elastic properties on the bias voltage ( V b ) applied on the substrate in the case of MS, compared with those of IBS-deposited BN films. The optical properties and the composition of the BN films were examined by spectroscopic ellipsometry (SE), whereas the chemical bonding was identified by Fourier Transform IR SE. The films' structure, morphology and density were also examined by X-ray diffraction and reflectivity and transmission electron microscopy. The elastic properties of the films were studied by nanoindentation techniques. Significant differences were found in composition, chemical bonding and structure of films grown by MS at various bias voltages.
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