A 500 keV ion beam accelerator for microbeam formation

Abstract

Abstract A 500 keV ion accelerator with a Disktron high-voltage generator has been developed for RBS analysis with microbeam and ion beam modification. An accelerating voltage stability of better than 4.5 × 10−4, with a long-term (∼1 h) current stability of better than 3%, was obtained for both proton and helium ions at 400 keV. The short-term (∼ ms) current stability, which is very important for RBS mapping measurements, was found to be better than 2 × 10−3. The X-ray dose rate around the accelerator was less than 0.03 mR/h at maximum with an acceleration of helium ions of 40 μA at an energy of 500 keV.