Abstract

This paper describes a 256-Kbit SRAM fabricated using a novel bipolar bit-line contact memory cell having a large static noise margin. Vertical PNP transistors are introduced at the bit-line contact area, which realizes lower operational voltage and a memory-cell area equivalent to a 4-NMOS-type cell. The minimum operating voltage is 1.4 V without using a boosting technique, and the access time is 60 ns at a V/sub cc/ of 1.8 V and room temperature. The power dissipation is 3.6 mW at a V/sub cc/ of 1.4 V. The operating V/sub cc/ range is 1.4-4.0 V.

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