Abstract
NAND flash memories are used in digital still cameras, cellular phones, MP3 players and various memory cards. As seen in the growing needs for applications such as solid-state drives and video camcoders, the market demands for larger-capacity storage has continuously increased and NAND flash memories are enabling a wide range of new applications. In such situations, to achieve larger capacity at low cost per bit, technical improvement in feature-size scaling, multi-bit per cell and area reduction are essential. To respond to such continuous requirements of cost reduction and density increase, 32 Gb 3 b/cell (D3) NAND flash memory with sub-35 nm CMOS process is developed. Introduction of sub-35 nm CMOS process and D3 technology doubles the capacity at almost the same chip area compared to previously published 43 nm 16 Gb 2 b/cell (D2) chip and about 80% chip area compared to previously published 56 nm 16 Gb D3 chip. The chip of size 9.215 x 12.247 mm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> = 112.86 mm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> enables the 32 Gb chip to fit in a microSD memory card. The chip architecture has 2 planes with 1.4 K blocks/plane, 1.5 MB block size and 8 KB page size. The block consists of 66 wordlines (WLs) containing 2 dummy WLs between select gates (SGs). All memory cells on the same WL have 3 pages and can be programmed and read simultaneously.
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