Abstract
The design of a high-voltage pulsing system for a plasma immersion ion implantation (PIII) facility is presented. A list of requirements, which have to be fulfilled by a high-voltage pulse generator to get best results and a optimum operation of the PIII system, is given. A simple electrical model of the plasma is presented which describes the plasma as a capacitive–resistive load. The model parameters are determined to fit experimental results. The requirements for the pulse generator can be fulfilled well using a pulse generator design which employs a hard tube switch. A pulse generator design is presented which is especially optimized for PIII systems. The hard tube control is especially optimized for obtaining voltage rise times as short as possible.
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