Abstract
Imprint lithography is essentially a micromolding process in which the topography of a template defines the patterns created on a substrate. When the printing is done at the nanoscale the various imprint methods are generally referred to as nanoimprint lithography (NIL). There are three basic approaches to imprint lithography: soft lithography (SL), thermal nanoimprint lithography (T-NIL), and ultraviolet nanoimprint lithography (UV-NIL). In addition, there is growing interest in a roll to roll (R2R) imprint process for large area substrates such as flat panels. Each approach is described in the following sections. Following this is a discussion devoted to defectivity mechanisms and defect reduction.
Published Version
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