Abstract
A novel top electrode (e.g., cathode) patterning technology using self‐assembly has been developed. The fabrication process is compatible with existing vacuum thermal evaporation techniques used in AMOLED mass production. The minimum feature size of the patterned electrode is demonstrated down to <6 μm. This method can be used to fabricate an auxiliary electrode on the top of an AMOLED display with sheet resistance < 1 Ω/□ and without damaging the sensitive front plane. Applications include reducing the IR drop in medium to large size panels and improving the performance of transparent AMOLED displays. A 17‐inch transparent AMOLED display panel with >60% transmission and improved performance was demonstrated using this technique.
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