Abstract
AbstractA Nd:YAG laser process on pure and doped SnO2 thin films was investigated as a key technology for a next generation flat panel displays manufacture replacing photolithography etching process on Indium‐Tin‐Oxide that is currently in use. It is found that the laser process is capable of making fine micro patterns on SnO2 thin films that have high carrier concentration by as low laser energy as 6J/cm2.
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