Abstract
Novel photolithography using NIR (Near Infrared) exposure and its photoresist are developed. Using NIR's extreme high transparency to photoresist polymer layer, photoresist with very high photosensitivity and vertical profile can be achieved. Combination with organic black pigment that blocks UV/visible light but is transparent to NIR, black photoresist with vertical profile and high film thickness can be made.
Full Text
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call