Abstract
In the photoresist stripping process of semiconductor manufacturing, a method with the ozone water and a disk-shaped nozzle is proposed in authors' previous studies. Moreover, it is suggested that the three-dimensional flow structure of the ozone water between a rotating silicon wafer and the disk-shaped nozzle affects the photoresist stripping rate. The purpose of the present study is to reveal this flow structure. In order to reveal this flow structure, the visualization experiment is conducted with dye and with stereoscopic micro PTV method. As a result, the injected dye forms a high concentrated area near the disk end Furthermore, it is cleared that the injected dye stays between two disks for more than 14 seconds. Besides, it is cleared that the circulation in r-z cross section is formed near the disk end.
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