Abstract
In this chapter we have presented a review of the state-of-the-art of diamond crystal growth using high pressure high temperature (HPHT) and chemical vapor deposition (CVD) approaches. We considered the main methods, techniques, and equipment used for single crystal diamond growth. Special attention is given to discussing the effects of growth conditions on the growth and properties of diamond. Current achievements in HPHT and CVD growth of single crystal diamond and its applications are considered.
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