Abstract
This chapter briefly describes the classical LIGA technique, starting with the mask-making process and ending with the molding technique, with an emphasis on deep X-ray lithography. The main process steps have given the technique its name, LIGA, a German acronym consisting of LI (lithographie for lithography), G (galvanik for electroplating), and A (abformung for replication techniques). LIGA allows for the manufacturing of microcomponents with almost arbitrary lateral geometry and resolution in the micron range, but with structure heights into the millimeter range. A variety of applications have been presented, mostly from the field of micro-optics, but also from other industrial areas that take advantage of LIGA-based microsystem technology. The chapter also describes the standard X-ray lithography process and its characteristics, based on Polymethyl methacrylate (PMMA) as the resist. With the advent of the UV-sensitive SU-8 resist family with its special optical properties, the LIGA concept has been extended to UV lithography, with ultraviolet light replacing the X-rays, followed by subsequent electroplating and molding. This process is known by the names UV-LIGA or poor man's LIGA, the latter because it does not require access to a synchrotron.
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