Abstract
Spinel-type iron oxide films were prepared on glass substrates at 400° C by plasma-enhanced metalorganic chemical vapor deposition using iron (III) acetylacetonate and oxygen as source gas and oxidizing gas, respectively. The effects of angle (θ) of the source and oxygen gas nozzle to the substrate surface, applied negative dc bias voltage and addition of reducing gas, H2, on the orientation of the films have been investigated. Highly crystalline and (100)-oriented spinel-type iron oxide films were obtained under conventional conditions only when θ was lower than 20°. However, even for θ higher than 20°, highly crystalline and (100)-oriented films could be obtained by applying negative dc bias voltage or adding H2 during the deposition. Magnetic properties and microstructures of the films were also examined.
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