Abstract

산화 및 수소 분위기 열처리를 통한 화학적 표면 개질로 나노다이아몬드 seed 입자의 응집성 완화 및 초미세나노결정질 다이아몬드 (UNCD) 박막 증착을 위한 핵형성 밀도 향상을 확보하였다. 열처리에 의해 나노다이아몬드 seed 입자표면 작용기가 개질되었고, 제타 전위도 증가하였다. 또한, 응집체 평균 크기가 약 <TEX>$2{\mu}m$</TEX>에서 ~55 nm로 크게 감소하였다. <TEX>$600^{\circ}C$</TEX>, 수소 열처리된 seed 입자로 seeding 한 Si 기판으로부터 열처리하지 않은 seed 입자에 비해 현저하게 향상된 <TEX>${\sim}2.7{\times}10^{11}cm^{-2}$</TEX>의 매우 높은 핵형성 밀도를 확보하였다. Surface chemical modification via air and hydrogen heat treatment was found to relieve the aggregation of nanodiamond (ND) seed particles and lead to a significantly enhanced nucleation density for ultrananocrystalline diamond (UNCD) film growth. After heat treatment in air and hydrogen, modification of surface functionalities and increase in the zeta potential were observed. Mean size of the ND aggregates was also dramatically reduced from <TEX>${\sim}2{\mu}m$</TEX> to ~55 nm. Si surface seeded with ND particles heat-treated at <TEX>$600^{\circ}C$</TEX> in hydrogen produced a much higher nucleation density of <TEX>${\sim}2.7{\times}10^{11}cm^{-2}$</TEX> compared to untreated ND seeds.

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